Manipdation of the Ti/Si reaction paths by introducing an amorphous Ge interlayer

نویسندگان

  • Z. Ma
  • H. Z. Xiao
  • L. H. Allen
  • B. J. Park
چکیده

Evolution of the Ti/a-GelSi trilayer reactions has been investigated using transmission electron microscopy and Auger electron spectroscopy. Instead of amorphous phase formation, as usually observed in the Ti/Si bilayer reaction, the crystalline Ti,GeS is the first phase observed during the reaction. Preceding the equilibrium C5CTi(Si,Ge),, a substitutional solid solution type C49-Ti(Si,Ge), forms upon annealing at 550-600 “C, regardless of the replacement of amorphous phase by the crystalline phase. The C49-to-C54 polymorphic transformation occurs at -650 “C. The reaction path is also correlated with the change in film resistance obtained from a four-point sheet resistance measurement.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Aluminum-induced Crystallization of Semiconductor Thin Films

Thin film materials of the semiconductors, such as silicon (Si), germanium (Ge) or their alloys, are turning into the most promising functional materials in the energy technology. However, the morphologies of these semiconductor thin films must be varied to be suitable for the different applications, e.g. a large-grained layer as the seed layer of thin film solar cells, a porous structure for a...

متن کامل

Viscosity and elastic constants of amorphous Si and Ge

The biaxial modulus and coefficient of thermal expansion of ion-beam-sputtered amorphous Si and Ge thin films were determined from curvature changes induced by differential thermal expansion. Viscous flow was measured by stress relaxation and was found to be Newtonian. The viscosity increased linearly with time as a result of structural relaxation, and its isoconfigurational activation enthalpy...

متن کامل

Effects of A-elements (A = Si, Ge or Sn) on the structure and electrical contact properties of Ti-A-C-Ag nanocomposites

Ti-A-C-Ag (A is Si, Ge or Sn) nanocomposite coatings have been deposited by dc magnetron sputtering in an ultra high vacuum chamber. Electron microscopy, energydispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, and x-ray diffraction show that all coatings contain nanocrystalline TiC and Ag grains in a matrix of mainly amorphous C. A C/Ti ratio above unity yields a homogenous distr...

متن کامل

Crystal chemistry of layered carbide, Ti3(Si0.43Ge0.57)C2

The crystal structure of a layered ternary carbide, Ti3(Si0.43Ge0.57)C2, was studied with single-crystal X-ray diffraction. The compound has a hexagonal symmetry with space group P63/mmc and unit-cell parameters a 1⁄4 3.0823(1) Å, c 1⁄4 17.7702(6) Å, and V 1⁄4 146.21(1) Å. The Si and Ge atoms in the structure occupy the same crystallographic site surrounded by six Ti atoms at an average distanc...

متن کامل

AN INVESTIGATION ON FATIGUE AND FATIGUE CORROSION BEHAVIOR OF Cr-Si SPRING STEEL AFTER Zn-Ni ELECTROPLATING USING WEIBULL STATISTICAL MODEL

Compression springs were prepared from Cr-Si high strength spring steel and coated with pure Zn and ZnNi by electroplating process. The effect of baking after electroplating as well as applying an electroless nickel interlayer on the fatigue and fatigue corrosion of the springs was investigated. The results were analyzed using weibull statistical model. A considerable improvement (8%) in fati...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 1999